Defect Induced Magnetism in Oxide Semiconductors provides an overview on the latest advances of defect engineering to create new magnetic materials and enable new technological applications. Sections introduce the mechanisms, behavior and theory of magnetism in oxide semiconductors and review methods of inducing magnetism in these materials. Then, strategies such as pulsed laser deposition and RF sputtering to grow oxide nanostructured materials with induced magnetism are discussed. This is followed by a review of the most relevant post-deposition methods to induce magnetism in oxide semiconductors, including annealing, ion irradiation, and ion implantation. Examples of defect induced magnetism in oxide semiconductors are then provided, along with selected applications. This title will be suitable reference for researchers in academia and practitioners in research and development in industry working in the disciplines of materials science and engineering.